20 µm process
Early CMOS process for RCA's CD4000 ICs.
Last updated
The 20 µm manufacturing process was an early semiconductor fabrication technology used for metal–oxide–semiconductor field-effect transistor (MOSFET) integrated circuits. It is historically significant as the process node for RCA's CD4000 series of integrated circuits, which began production in 1968, marking one of the first commercial applications of CMOS technology.
Quick Facts
- Process node
- 20 µm
- First commercial product
- RCA CD4000 series ICs
- Year introduced
- 1968
- Technology type
- CMOS
Facts from the source article.
Lore & Background
The 20 µm manufacturing process was employed by RCA for its CD4000 series of integrated circuits, which began in 1968. This series was among the first commercial CMOS logic families, offering low power consumption compared to earlier bipolar logic families. The process node represents a relatively large feature size by modern standards, typical of early MOSFET fabrication.
Reader's Guide
The 20 µm process node is a foundational milestone in the history of semiconductor manufacturing. It enabled the production of the RCA CD4000 series, which introduced CMOS technology to a wide range of commercial applications.
CMOS (complementary metal–oxide–semiconductor) logic became dominant due to its low static power dissipation, and the CD4000 series helped establish this advantage. Although the 20 µm node is now obsolete, it represents the starting point for the miniaturization trend that has driven the semiconductor industry for decades. The CD4000 series remained in production for many years, influencing later CMOS logic families.
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Sources
Compiled from Wikipedia and the sources listed below. Text from Wikipedia is available under CC BY-SA 4.0; this entry is adapted from it.
- Wikipedia: List of semiconductor scale examples (CC BY-SA 4.0).
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